High aspect ratio silicon ring-shape micropillars fabricated by deep reactive ion etching with sacrificial structures - ScienceDirect
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Micro‐/Nanopillars for Micro‐ and Nanotechnologies Using
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Enhanced metal assisted etching method for high aspect ratio
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High aspect ratio silicon and polyimide nanopillars by combination
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Wafer-scale 3D shaping of high aspect ratio structures by multistep plasma etching and corner lithography
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Versatilely tuned vertical silicon nanowire arrays by cryogenic
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Glass based micro total analysis systems: Materials, fabrication
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PDF) Recent Advances in Reactive Ion Etching and Applications of
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Polymeric-based microneedle arrays as potential platforms in the
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Figure 2 from Ultra Deep Reactive Ion Etching of High Aspect-Ratio
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Ultra Deep Reactive Ion Etching of High Aspect-Ratio and Thick
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Micromachines, Free Full-Text
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PDF] An advanced reactive ion etching process for very high aspect